PROCESSING APPARATUS AND PROCESSING METHOD

A processing apparatus according to the present embodiment includes a piezoelectric sensor unit, an irradiating unit, a calculating unit, a moving unit, and a controlling unit. The piezoelectric sensor unit is mounted with an object and outputs an electric signal corresponding to a pressure due to the weight of the object. The irradiating unit irradiates a portion of the object on the piezoelectric sensor unit with a beam. The calculating unit calculates a first amount of misregistration between the portion of the object which should be irradiated with the beam and an actual position irradiated by the beam on the basis of the electric signal from the piezoelectric sensor unit. The moving unit moves the irradiating unit. The controlling unit controls the irradiating unit or the moving unit in accordance with the first amount of misregistration.