PARALLEL MULTI WAFER AXIAL SPIN CLEAN PROCESSING USING SPIN CASSETTE INSIDE MOVABLE PROCESS CHAMBER

PARALLEL MULTI WAFER AXIAL SPIN CLEAN PROCESSING USING SPIN CASSETTE INSIDE MOVABLE PROCESS CHAMBER

A system and method concurrently processes multiple wafers. A cassette structure includes multiple chucks and a drive spool for supporting and rotating the chucks. Each chuck holds a wafer in position while rotating. The cassette structure is loaded into a process chamber. Each chuck includes a self...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: BRAR AMULDEEP S, LEE NAMPYO, HAN WOOSUNG
Format: Patent
Sprache:eng
Schlagworte:
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:A system and method concurrently processes multiple wafers. A cassette structure includes multiple chucks and a drive spool for supporting and rotating the chucks. Each chuck holds a wafer in position while rotating. The cassette structure is loaded into a process chamber. Each chuck includes a self-locking mechanism that is activated by the centrifugal force generated from the rotation of the chuck. The self-locking mechanism centers and holds a wafer in position with respect to the chuck. A drive motor drives the drive spool, which causes the chucks to rotate. As the chucks are being rotated, a dispensing assembly delivers a processing chemical to the wafers.