Method for producing protective layers containing silicides and/or oxidized silicides on substrates

The invention relates to a method for producing protective layers containing silicides and/or oxidized silicides on a substrate, in which silicide or a precursor thereof is applied to the substrate and the coated substrate is subjected to a temperature treatment above 250° C. without further process...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: DEMUTH MARTIN, KESSLER HANS-JÜRG
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:The invention relates to a method for producing protective layers containing silicides and/or oxidized silicides on a substrate, in which silicide or a precursor thereof is applied to the substrate and the coated substrate is subjected to a temperature treatment above 250° C. without further processing. The layers obtained have a thickness in the nano-range and can simultaneously have various characteristic features, i.e. they are multifunctional. The following characteristic features were found for these nanolayers: scratch resistance, abrasion resistance, corrosion resistance and temperature resistance up to 1500° C., depending in each case on the substrate and the silicide(oxide) used for the coating.