NON-WOVEN FABRIC SUBSTRATE FOR WIPING SHEET
According to a nonwoven fabric substrate (1) for wiping sheet of the invention, ridges (2) and grooves (3) are alternately formed at positions corresponding to each other on both surfaces (1a, 1b), and apertures (4) are formed in the grooves (3). Each of the ridges (2) and the grooves (3) extend par...
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creator | WADA MINORU HAYASE TAEKO SHIRASAKI EMIKO |
description | According to a nonwoven fabric substrate (1) for wiping sheet of the invention, ridges (2) and grooves (3) are alternately formed at positions corresponding to each other on both surfaces (1a, 1b), and apertures (4) are formed in the grooves (3). Each of the ridges (2) and the grooves (3) extend parallel to one side of the nonwoven fabric substrate (1). Each of the grooves (3) alternately includes an aperture portion (3h) which has a plurality of the apertures (4), and a non-aperture portion (3n) which has no aperture (4) and is longer than a distance between the nearest end portions of the adjacent apertures (4) in the aperture portion (3h). An arrangement pattern of the aperture portion (3h) and the non-aperture portion (3n) provided in the groove (3a) is different from an arrangement pattern of the aperture portion (3h) and the non-aperture portion (3n) provided in an adjacent groove (3b). When the whole of the nonwoven fabric substrate (1) is seen in planar view, the nonwoven fabric substrate (1) has an aperture region (11) formed by the aperture portions (3h) of a plurality of the grooves (3), and a non-aperture region (12) formed by the non-aperture portions (3n) of a plurality of the grooves (3). Each of the aperture region (11) and the non-aperture region (12) is arranged in a predetermined pattern. |
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Each of the ridges (2) and the grooves (3) extend parallel to one side of the nonwoven fabric substrate (1). Each of the grooves (3) alternately includes an aperture portion (3h) which has a plurality of the apertures (4), and a non-aperture portion (3n) which has no aperture (4) and is longer than a distance between the nearest end portions of the adjacent apertures (4) in the aperture portion (3h). An arrangement pattern of the aperture portion (3h) and the non-aperture portion (3n) provided in the groove (3a) is different from an arrangement pattern of the aperture portion (3h) and the non-aperture portion (3n) provided in an adjacent groove (3b). When the whole of the nonwoven fabric substrate (1) is seen in planar view, the nonwoven fabric substrate (1) has an aperture region (11) formed by the aperture portions (3h) of a plurality of the grooves (3), and a non-aperture region (12) formed by the non-aperture portions (3n) of a plurality of the grooves (3). Each of the aperture region (11) and the non-aperture region (12) is arranged in a predetermined pattern.</description><language>eng</language><subject>BRAIDING ; COFFEE MILLS ; COTTON-WOOL ; DOMESTIC ARTICLES OR APPLIANCES ; DOMESTIC WASHING OR CLEANING ; FABRICS MADE BY SUCH PROCESSES OR APPARATUS, e.g. FELTS,NON-WOVEN FABRICS ; FURNITURE ; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC ; GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS ; HUMAN NECESSITIES ; KNITTING ; LACE-MAKING ; MAKING TEXTILE FABRICS, e.g. FROM FIBRES OR FILAMENTARYMATERIAL ; NON-WOVEN FABRICS ; SPICE MILLS ; SUCTION CLEANERS IN GENERAL ; TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION ; TECHNICAL SUBJECTS COVERED BY FORMER USPC ; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS ; TEXTILES ; TRIMMINGS ; WADDING</subject><creationdate>2015</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20151022&DB=EPODOC&CC=US&NR=2015297053A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25544,76293</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20151022&DB=EPODOC&CC=US&NR=2015297053A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>WADA MINORU</creatorcontrib><creatorcontrib>HAYASE TAEKO</creatorcontrib><creatorcontrib>SHIRASAKI EMIKO</creatorcontrib><title>NON-WOVEN FABRIC SUBSTRATE FOR WIPING SHEET</title><description>According to a nonwoven fabric substrate (1) for wiping sheet of the invention, ridges (2) and grooves (3) are alternately formed at positions corresponding to each other on both surfaces (1a, 1b), and apertures (4) are formed in the grooves (3). Each of the ridges (2) and the grooves (3) extend parallel to one side of the nonwoven fabric substrate (1). Each of the grooves (3) alternately includes an aperture portion (3h) which has a plurality of the apertures (4), and a non-aperture portion (3n) which has no aperture (4) and is longer than a distance between the nearest end portions of the adjacent apertures (4) in the aperture portion (3h). An arrangement pattern of the aperture portion (3h) and the non-aperture portion (3n) provided in the groove (3a) is different from an arrangement pattern of the aperture portion (3h) and the non-aperture portion (3n) provided in an adjacent groove (3b). When the whole of the nonwoven fabric substrate (1) is seen in planar view, the nonwoven fabric substrate (1) has an aperture region (11) formed by the aperture portions (3h) of a plurality of the grooves (3), and a non-aperture region (12) formed by the non-aperture portions (3n) of a plurality of the grooves (3). Each of the aperture region (11) and the non-aperture region (12) is arranged in a predetermined pattern.</description><subject>BRAIDING</subject><subject>COFFEE MILLS</subject><subject>COTTON-WOOL</subject><subject>DOMESTIC ARTICLES OR APPLIANCES</subject><subject>DOMESTIC WASHING OR CLEANING</subject><subject>FABRICS MADE BY SUCH PROCESSES OR APPARATUS, e.g. FELTS,NON-WOVEN FABRICS</subject><subject>FURNITURE</subject><subject>GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC</subject><subject>GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS</subject><subject>HUMAN NECESSITIES</subject><subject>KNITTING</subject><subject>LACE-MAKING</subject><subject>MAKING TEXTILE FABRICS, e.g. FROM FIBRES OR FILAMENTARYMATERIAL</subject><subject>NON-WOVEN FABRICS</subject><subject>SPICE MILLS</subject><subject>SUCTION CLEANERS IN GENERAL</subject><subject>TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION</subject><subject>TECHNICAL SUBJECTS COVERED BY FORMER USPC</subject><subject>TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS</subject><subject>TEXTILES</subject><subject>TRIMMINGS</subject><subject>WADDING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2015</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZND28_fTDfcPc_VTcHN0CvJ0VggOdQoOCXIMcVVw8w9SCPcM8PRzVwj2cHUN4WFgTUvMKU7lhdLcDMpuriHOHrqpBfnxqcUFicmpeakl8aHBRgaGpkaW5gamxo6GxsSpAgAMfCXj</recordid><startdate>20151022</startdate><enddate>20151022</enddate><creator>WADA MINORU</creator><creator>HAYASE TAEKO</creator><creator>SHIRASAKI EMIKO</creator><scope>EVB</scope></search><sort><creationdate>20151022</creationdate><title>NON-WOVEN FABRIC SUBSTRATE FOR WIPING SHEET</title><author>WADA MINORU ; HAYASE TAEKO ; SHIRASAKI EMIKO</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US2015297053A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2015</creationdate><topic>BRAIDING</topic><topic>COFFEE MILLS</topic><topic>COTTON-WOOL</topic><topic>DOMESTIC ARTICLES OR APPLIANCES</topic><topic>DOMESTIC WASHING OR CLEANING</topic><topic>FABRICS MADE BY SUCH PROCESSES OR APPARATUS, e.g. FELTS,NON-WOVEN FABRICS</topic><topic>FURNITURE</topic><topic>GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC</topic><topic>GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS</topic><topic>HUMAN NECESSITIES</topic><topic>KNITTING</topic><topic>LACE-MAKING</topic><topic>MAKING TEXTILE FABRICS, e.g. FROM FIBRES OR FILAMENTARYMATERIAL</topic><topic>NON-WOVEN FABRICS</topic><topic>SPICE MILLS</topic><topic>SUCTION CLEANERS IN GENERAL</topic><topic>TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION</topic><topic>TECHNICAL SUBJECTS COVERED BY FORMER USPC</topic><topic>TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS</topic><topic>TEXTILES</topic><topic>TRIMMINGS</topic><topic>WADDING</topic><toplevel>online_resources</toplevel><creatorcontrib>WADA MINORU</creatorcontrib><creatorcontrib>HAYASE TAEKO</creatorcontrib><creatorcontrib>SHIRASAKI EMIKO</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>WADA MINORU</au><au>HAYASE TAEKO</au><au>SHIRASAKI EMIKO</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>NON-WOVEN FABRIC SUBSTRATE FOR WIPING SHEET</title><date>2015-10-22</date><risdate>2015</risdate><abstract>According to a nonwoven fabric substrate (1) for wiping sheet of the invention, ridges (2) and grooves (3) are alternately formed at positions corresponding to each other on both surfaces (1a, 1b), and apertures (4) are formed in the grooves (3). Each of the ridges (2) and the grooves (3) extend parallel to one side of the nonwoven fabric substrate (1). Each of the grooves (3) alternately includes an aperture portion (3h) which has a plurality of the apertures (4), and a non-aperture portion (3n) which has no aperture (4) and is longer than a distance between the nearest end portions of the adjacent apertures (4) in the aperture portion (3h). An arrangement pattern of the aperture portion (3h) and the non-aperture portion (3n) provided in the groove (3a) is different from an arrangement pattern of the aperture portion (3h) and the non-aperture portion (3n) provided in an adjacent groove (3b). When the whole of the nonwoven fabric substrate (1) is seen in planar view, the nonwoven fabric substrate (1) has an aperture region (11) formed by the aperture portions (3h) of a plurality of the grooves (3), and a non-aperture region (12) formed by the non-aperture portions (3n) of a plurality of the grooves (3). Each of the aperture region (11) and the non-aperture region (12) is arranged in a predetermined pattern.</abstract><oa>free_for_read</oa></addata></record> |
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recordid | cdi_epo_espacenet_US2015297053A1 |
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subjects | BRAIDING COFFEE MILLS COTTON-WOOL DOMESTIC ARTICLES OR APPLIANCES DOMESTIC WASHING OR CLEANING FABRICS MADE BY SUCH PROCESSES OR APPARATUS, e.g. FELTS,NON-WOVEN FABRICS FURNITURE GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS HUMAN NECESSITIES KNITTING LACE-MAKING MAKING TEXTILE FABRICS, e.g. FROM FIBRES OR FILAMENTARYMATERIAL NON-WOVEN FABRICS SPICE MILLS SUCTION CLEANERS IN GENERAL TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION TECHNICAL SUBJECTS COVERED BY FORMER USPC TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS TEXTILES TRIMMINGS WADDING |
title | NON-WOVEN FABRIC SUBSTRATE FOR WIPING SHEET |
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