NON-WOVEN FABRIC SUBSTRATE FOR WIPING SHEET

According to a nonwoven fabric substrate (1) for wiping sheet of the invention, ridges (2) and grooves (3) are alternately formed at positions corresponding to each other on both surfaces (1a, 1b), and apertures (4) are formed in the grooves (3). Each of the ridges (2) and the grooves (3) extend par...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: WADA MINORU, HAYASE TAEKO, SHIRASAKI EMIKO
Format: Patent
Sprache:eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:According to a nonwoven fabric substrate (1) for wiping sheet of the invention, ridges (2) and grooves (3) are alternately formed at positions corresponding to each other on both surfaces (1a, 1b), and apertures (4) are formed in the grooves (3). Each of the ridges (2) and the grooves (3) extend parallel to one side of the nonwoven fabric substrate (1). Each of the grooves (3) alternately includes an aperture portion (3h) which has a plurality of the apertures (4), and a non-aperture portion (3n) which has no aperture (4) and is longer than a distance between the nearest end portions of the adjacent apertures (4) in the aperture portion (3h). An arrangement pattern of the aperture portion (3h) and the non-aperture portion (3n) provided in the groove (3a) is different from an arrangement pattern of the aperture portion (3h) and the non-aperture portion (3n) provided in an adjacent groove (3b). When the whole of the nonwoven fabric substrate (1) is seen in planar view, the nonwoven fabric substrate (1) has an aperture region (11) formed by the aperture portions (3h) of a plurality of the grooves (3), and a non-aperture region (12) formed by the non-aperture portions (3n) of a plurality of the grooves (3). Each of the aperture region (11) and the non-aperture region (12) is arranged in a predetermined pattern.