METHOD AND SYSTEM FOR OPTICAL PROXIMITY CORRECTION (OPC)

An Optical Proximity Correction (OPC) method is provided for compensating the Optical Proximity Effect (OPE) influence. The method include providing a substrate having at least one semiconductor structure and with a plurality of regions, providing a target pattern to be formed on the substrate, and...

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Bibliographische Detailangaben
Hauptverfasser:	CHENG RENQIANG, WANG HUI
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CALCULATING CINEMATOGRAPHY COMPUTING COUNTING ELECTRIC DIGITAL DATA PROCESSING ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	An Optical Proximity Correction (OPC) method is provided for compensating the Optical Proximity Effect (OPE) influence. The method include providing a substrate having at least one semiconductor structure and with a plurality of regions, providing a target pattern to be formed on the substrate, and respectively obtaining aerial image light intensity functions of the plurality of regions of the substrate. The method also includes establishing an OPC model based on the aerial image light intensity functions of the plurality of regions, and performing an OPC process to the target pattern by using the OPC model to adjust the target pattern factoring in optical effect of the plurality of regions.