RECESSED SEMICONDUCTOR SUBSTRATES AND ASSOCIATED TECHNIQUES

Embodiments of the present disclosure provide a method, comprising providing a semiconductor substrate having (i) a first surface and (ii) a second surface that is disposed opposite to the first surface, forming one or more vias in the first surface of the semiconductor substrate, the one or more vi...

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Bibliographische Detailangaben
Hauptverfasser: LIOU SHIANN-MING, WEI CHIENUAN, CHEN ROAWEN, WU ALBERT, CHANG RUNZI, WU SCOTT, HAN CHUNG CHYUNG (JUSTIN), CHENG CHUANNG
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:Embodiments of the present disclosure provide a method, comprising providing a semiconductor substrate having (i) a first surface and (ii) a second surface that is disposed opposite to the first surface, forming one or more vias in the first surface of the semiconductor substrate, the one or more vias initially passing through only a portion of the semiconductor substrate without reaching the second surface, forming a dielectric film on the first surface of the semiconductor substrate, forming a redistribution layer on the dielectric film, the redistribution layer being electrically coupled to the one or more vias, coupling one or more dies to the redistribution layer, forming a molding compound to encapsulate at least a portion of the one or more dies, and recessing the second surface of the semiconductor substrate to expose the one or more vias. Other embodiments may be described and/or claimed.