Reticle Cooling System In A Lithographic Apparatus

A system for controlling temperature of a patterning device in a lithographic apparatus is discussed. The system includes a patterning device support configured to support a patterning device and a reticle cooling system configured to provide substantially uniform temperature distribution across the...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	VAN BOXTEL FRANK JOHANNES JACOBUS, ALIKHAN ABDULLAH, SCHUSTER MARK JOSEF, DELMASTRO PETER A, WARD CHRISTOPHER CHARLES, VENTURINO THOMAS, NAYFEH SAMIR A, VERDIRAME JUSTIN MATTHEW, ONVLEE JOHANNES, GALBURT DANIEL NICHOLAS, EBERT, JR. EARL WILLIAM, BURBANK DANIEL NATHAN
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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