Reticle Cooling System In A Lithographic Apparatus

A system for controlling temperature of a patterning device in a lithographic apparatus is discussed. The system includes a patterning device support configured to support a patterning device and a reticle cooling system configured to provide substantially uniform temperature distribution across the...

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Bibliographische Detailangaben
Hauptverfasser:	VAN BOXTEL FRANK JOHANNES JACOBUS, ALIKHAN ABDULLAH, SCHUSTER MARK JOSEF, DELMASTRO PETER A, WARD CHRISTOPHER CHARLES, VENTURINO THOMAS, NAYFEH SAMIR A, VERDIRAME JUSTIN MATTHEW, ONVLEE JOHANNES, GALBURT DANIEL NICHOLAS, EBERT, JR. EARL WILLIAM, BURBANK DANIEL NATHAN
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	A system for controlling temperature of a patterning device in a lithographic apparatus is discussed. The system includes a patterning device support configured to support a patterning device and a reticle cooling system configured to provide substantially uniform temperature distribution across the patterning device. The reticle cooling system includes a first and second array of gas inlets configured to provide a first and second gas flow along a first and second direction across a surface of the patterning device, respectively, where first and second directions are opposite to each other. The reticle cooling system further includes a switching control system configured to control operation of the first and second arrays of gas inlets.