Pattern Inspecting and Measuring Device and Program

Pattern Inspecting and Measuring Device and Program

Provided is a pattern inspecting and measuring device that decreases the influence of noise and the like and increases the reliability of an inspection or measurement result during inspection or measurement using the position of an edge extracted from image data obtained by imaging a pattern as the...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: SHINDO HIROYUKI, HIROI TAKASHI, TOYODA YASUTAKA, SHINODA SHINICHI, FUKUNAGA FUMIHIKO, NINOMIYA TAKU, MINAKAWA TSUYOSHI, YOSHIDA TAKEYUKI, YAMAMOTO TAKUMA
Format: Patent
Sprache:eng
Schlagworte:
CALCULATING
COMPUTING
COUNTING
HANDLING RECORD CARRIERS
IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
PHYSICS
PRESENTATION OF DATA
RECOGNITION OF DATA
RECORD CARRIERS
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Beschreibung
Zusammenfassung:Provided is a pattern inspecting and measuring device that decreases the influence of noise and the like and increases the reliability of an inspection or measurement result during inspection or measurement using the position of an edge extracted from image data obtained by imaging a pattern as the object of inspection or measurement. For this purpose, in the pattern inspecting and measuring device in which inspection or measurement of an inspection or measurement object pattern is performed using the position of the edge extracted, with the use of an edge extraction parameter, from the image data obtained by imaging the inspection or measurement object pattern, the edge extraction parameter is generated using a reference pattern having a shape as an inspection or measurement reference and the image data.