COOLING SYSTEM FOR AT LEAST ONE SYSTEM COMPONENT OF AN OPTICAL SYSTEM FOR EUV APPLICATIONS AND SYSTEM COMPONENT OF THIS TYPE AND OPTICAL SYSTEM OF THIS TYPE

COOLING SYSTEM FOR AT LEAST ONE SYSTEM COMPONENT OF AN OPTICAL SYSTEM FOR EUV APPLICATIONS AND SYSTEM COMPONENT OF THIS TYPE AND OPTICAL SYSTEM OF THIS TYPE

A cooling system for at least one system component of an optical system for EUV applications comprises at least one cooling channel and a cooling medium for passing through the at least one cooling channel, absorbing heat from the at least one system component and for carrying off the heat. The cool...

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Bibliographische Detailangaben
1. Verfasser: FIGUEREDO STACY
Format: Patent
Sprache:eng
Schlagworte:
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
OPTICS
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Beschreibung
Zusammenfassung:A cooling system for at least one system component of an optical system for EUV applications comprises at least one cooling channel and a cooling medium for passing through the at least one cooling channel, absorbing heat from the at least one system component and for carrying off the heat. The cooling medium comprises a dielectric fluid, excluding pure water, 1,1,1,2-Tetrafluoroethane (R134a) and Chlorodifluoro-methane (R22).The dielectric fluid comprises a liquid phase at an operating pressure below 10 bar and in a temperature range of approximately 10° C. to approximately 50° C.