LOAD PORT APPARATUS

LOAD PORT APPARATUS

To prevent an increase with the passage of time in partial pressure of oxidizing gas in a FOUP, which is fixed to a FIMS system in an open state, a gas feed port is arranged on a lower surface of the FOUP so as to feed nitrogen to an inside of the FOUP through the gas feed port in a state where the...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: EMOTO JUN, IWAMOTO TADAMASA
Format: Patent
Sprache:eng
Schlagworte:
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:To prevent an increase with the passage of time in partial pressure of oxidizing gas in a FOUP, which is fixed to a FIMS system in an open state, a gas feed port is arranged on a lower surface of the FOUP so as to feed nitrogen to an inside of the FOUP through the gas feed port in a state where the FOUP is mounted on the FIMS system, in addition to nitrogen purge from an opening of the FOUP. A nitrogen feed system, which feeds nitrogen in a state where the FOUP is mounted on the FIMS system, is controlled so as to feed nitrogen at a low flow rate and a low pressure capable of suppressing the stirring-up of dust, which has a size that may cause a problem in wiring to be formed on a wafer, from the gas feed port and the like.