Lithographic Apparatus and Method of Manufacturing a Device

There is disclosed a lithographic apparatus provided with a spectral purity filter which may be provided in one or more of the following locations: (a) in the illumination system, (b) adjacent the patterning device, either a static location in the radiation beam or fixed for movement with the patter...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Hauptverfasser:	MINNAERT ARTHUR WINFRIED EDUARDUS, VAN KAMPEN MAARTEN, YAKUNIN ANDREI MIKHAILOVICH, BAL KURSTAT, HUIJBERTS ALEXANDER MARINUS ARNOLDUS, GASSELING PAULUS ALBERTUS MARIA, SCACCABAROZZI LUIGI, BANINE VADIM YEVGENYEVICH, RIZO DIAGO PEDRO JULIAN, MALLMANN HANS JOERG, NIENHUYS HAN-KWANG, MUITJENS JOHANNUS ELISABETH HUBERTUS, VAN AERLE NICOLAAS ALDEGONDA JAN MARIA, LUIJTEN CARLO CORNELIS MARIA
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	There is disclosed a lithographic apparatus provided with a spectral purity filter which may be provided in one or more of the following locations: (a) in the illumination system, (b) adjacent the patterning device, either a static location in the radiation beam or fixed for movement with the patterning device, (c) in the projection system, and (d) adjacent the substrate table. The spectral purity filter is preferably a membrane formed of polysilicon, a multilayer material, a carbon nanotube material or graphene. The membrane may be provided with a protective capping layer, and/or a thin metal transparent layer.