METHOD OF PROCESSING A SUBSTRATE AND APPARATUS FOR PERFORMING THE SAME
In a method of processing a substrate, a first plasma may be generated from a first reaction gas. A second plasma may be generated from a second reaction gas. The first plasma and the second plasma may be individually applied to the substrate. Thus, each of the at least two remote plasma sources may...
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| creator | VLADMIR VOLYNETS LEE SANG-HEON KIM GON-JUN JEON SANG-JEAN PARK YONG-KYUN KIM SAM HYUNG-SAM SONG INOL |
| description | In a method of processing a substrate, a first plasma may be generated from a first reaction gas. A second plasma may be generated from a second reaction gas. The first plasma and the second plasma may be individually applied to the substrate. Thus, each of the at least two remote plasma sources may generate at least two plasmas under different process recipes, which may be optimized for processing the substrate. As a result, the substrate processed using the optimal plasmas may have a desired shape. |
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| subjects | BASIC ELECTRIC ELEMENTS ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES |
| title | METHOD OF PROCESSING A SUBSTRATE AND APPARATUS FOR PERFORMING THE SAME |
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