IN-SITU RELAXATION FOR IMPROVED CMOS PRODUCT LIFETIME

IN-SITU RELAXATION FOR IMPROVED CMOS PRODUCT LIFETIME

Methods and structures for restoring an electrical parameter of a field-effect transistor in an integrated circuit deployed in an end product. A source, a drain, and a gate electrode of a field-effect transistor are coupled with ground. A restoration voltage is applied to a well beneath the field-ef...

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Bibliographische Detailangaben
Hauptverfasser: SHERONY MELANIE J, SCHNABEL CHRISTOPHER M, HOOK TERENCE B
Format: Patent
Sprache:eng
Schlagworte:
BASIC ELECTRIC ELEMENTS
BASIC ELECTRONIC CIRCUITRY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
PULSE TECHNIQUE
SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:Methods and structures for restoring an electrical parameter of a field-effect transistor in an integrated circuit deployed in an end product. A source, a drain, and a gate electrode of a field-effect transistor are coupled with ground. A restoration voltage is applied to a well beneath the field-effect transistor while the source, the drain, and the gate electrode of the field-effect transistor are coupled with ground. The well may be coupled with either a positive supply voltage or ground when a switch is in a first position during normal operation of the integrated circuit and with the restoration voltage when the switch is in a second position during a relaxation operation.