Positive Photosensitive Resin Composition, Photosensitive Resin Film Prepared by Using the Same, and Display Device
Disclosed are a positive photosensitive resin composition including (A) a polybenzoxazole precursor having a polydispersity of about 1 to about 1.6; (B) a photosensitive diazoquinone compound; (C) a thermal acid generator; and (D) a solvent, a photosensitive resin film using the same, and a display...
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| creator | KIM SANG-SOO HWANG INUL LEE JONG-HWA BAEK JAE-YEOL LEE JIN-YOUNG KANG JIN-HEE NOH KUN-BAE KIM DAE-YUN SONG JAE-HWAN PARK EUN-BI HWANG EUN-HA KWON JI-YUN HONG CHUNG-BEUM KIM SANG-KYEON KIM YONG-TAE LEE BUM-JIN |
| description | Disclosed are a positive photosensitive resin composition including (A) a polybenzoxazole precursor having a polydispersity of about 1 to about 1.6; (B) a photosensitive diazoquinone compound; (C) a thermal acid generator; and (D) a solvent, a photosensitive resin film using the same, and a display device. |
| format | Patent |
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(B) a photosensitive diazoquinone compound; (C) a thermal acid generator; and (D) a solvent, a photosensitive resin film using the same, and a display device.</abstract><oa>free_for_read</oa></addata></record> |
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| language | eng |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
| title | Positive Photosensitive Resin Composition, Photosensitive Resin Film Prepared by Using the Same, and Display Device |
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