OPEN-LOOP THERMAL MANAGEMENT PROCESS AND SYSTEM

Open-loop thermal management systems and open-loop thermal management processes are disclosed. The process includes providing an open-loop thermal management system, saturating a reactor of the system with gas while a flow control unit prevents flow of the gas from the reactor, and maintaining a gas...

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Bibliographische Detailangaben
Hauptverfasser:	YAKSHI-TAFTI EHSAN, TANG XUDONG
Format:	Patent
Sprache:	eng
Schlagworte:	BLASTING CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY HEAT EXCHANGE IN GENERAL HEAT-EXCHANGE APPARATUS, NOT PROVIDED FOR IN ANOTHER SUBCLASS,IN WHICH THE HEAT-EXCHANGE MEDIA DO NOT COME INTO DIRECT CONTACT HEATING LIGHTING MECHANICAL ENGINEERING PERFORMING OPERATIONS PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL THEIR RELEVANT APPARATUS TRANSPORTING WEAPONS
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Beschreibung
Zusammenfassung:	Open-loop thermal management systems and open-loop thermal management processes are disclosed. The process includes providing an open-loop thermal management system, saturating a reactor of the system with gas while a flow control unit prevents flow of the gas from the reactor, and maintaining a gas dissociation pressure range of the gas within the reactor. The system includes the reactor being arranged to receive a heat load. The reactor contains metal hydrides, metal organic framework, or a combination thereof. The reactor includes at least one venting line extending from the reactor. Also, the flow control unit is configured to adjustably control the flow of gas from the reactor to maintain the gas dissociation pressure range.