APPARATUS AND PROCESS FOR PRODUCING FLUORINATED ORGANOSILICON COMPOUND THIN FILM

To provide an apparatus and process capable of continuously forming a fluorinated organosilicon compound thin film having high durability while a substrate is transported. An apparatus for producing a fluorinated organosilicon compound thin film, which comprises a chamber, a heating container for he...

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Bibliographische Detailangaben
Hauptverfasser:	MIYAMURA MASAO, MORIMOTO TAMOTSU, KATO RYOSUKE
Format:	Patent
Sprache:	eng
Schlagworte:	ADHESIVES APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL CHEMICAL PAINT OR INK REMOVERS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL CORRECTING FLUIDS DIFFUSION TREATMENT OF METALLIC MATERIAL DYES FILLING PASTES INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL INKS METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS PAINTS PASTES OR SOLIDS FOR COLOURING OR PRINTING PERFORMING OPERATIONS POLISHES PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL SPRAYING OR ATOMISING IN GENERAL SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TRANSPORTING USE OF MATERIALS THEREFOR WOODSTAINS
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Beschreibung
Zusammenfassung:	To provide an apparatus and process capable of continuously forming a fluorinated organosilicon compound thin film having high durability while a substrate is transported. An apparatus for producing a fluorinated organosilicon compound thin film, which comprises a chamber, a heating container for heating a deposition material, a plurality of nozzles for supplying the deposition material to a substrate, provided in the chamber and connected to the heating container, and a substrate transport mechanism for transporting the substrate, wherein the plurality of nozzles are arranged in a line so that they cross the direction of transport of the substrate, and a fluorinated organosilicon compound as the deposition material is one subjected to a solvent removal treatment or one not diluted; and a process for producing a fluorinated organosilicon compound thin film, which comprises heating a fluorinated organosilicon compound subjected to a solvent removal treatment or not diluted, in a heating container, supplying the deposition material from a plurality of nozzles arranged in a line so that they cross the direction of transport of the substrate, provided in a chamber and connected to the heating container, and forming a thin film on a surface of the substrate on which a thin film is to be formed, while the substrate is transported.