METHOD FOR MEASURING TEMPERATURE OF FILM IN REACTION CHAMBER

A method for measuring a temperature of a film in a reaction chamber is provided. The method includes: obtaining reflectivity sampling data R of a sampling point set in a detection area of the film for light with a wavelength λ, and thermal radiation value sampling data E of the sampling point set;...

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Bibliographische Detailangaben
Hauptverfasser: MA YANZHONG, CHEN ZHEHAO, ZHANG CHAOQIAN, CHEN LU, TIANXIAO LEE STEVEN, LI YOUSEN
Format: Patent
Sprache:eng
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Zusammenfassung:A method for measuring a temperature of a film in a reaction chamber is provided. The method includes: obtaining reflectivity sampling data R of a sampling point set in a detection area of the film for light with a wavelength λ, and thermal radiation value sampling data E of the sampling point set; obtaining a first correction factor α and a second correction factor γ according to values of at least two sampling data groups, wherein 0