METHOD FOR BONDING A TANTALUM STRUCTURE TO A COBALT-ALLOY SUBSTRATE

Methods for bonding a porous tantalum structure to a substrate are provided. The method includes placing a compressible or porous interlayer between a porous tantalum structure and a cobalt or cobalt-chromium substrate to form an assembly. The interlayer comprising a metal or metal alloy that has so...

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Hauptverfasser: HARMON CASEY, PEEK LAWRENCE F, MILLER DAVID M, HIPPENSTEEL GREGORY M, ANDERSON JEFFREY P, ALLEN STEVE M, GORHE DEVENDRA, SCRAFTON JOEL G, PANCHISON CLARENCE M
Format: Patent
Sprache:eng
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Zusammenfassung:Methods for bonding a porous tantalum structure to a substrate are provided. The method includes placing a compressible or porous interlayer between a porous tantalum structure and a cobalt or cobalt-chromium substrate to form an assembly. The interlayer comprising a metal or metal alloy that has solid state solubility with both the substrate and the porous tantalum structure. Heat and pressure are applied to the assembly to achieve solid state diffusion between the substrate and the interlayer and the between the porous tantalum structure and the interlayer.