PREPARATION, PURIFICATION AND USE OF HIGH-X DIBLOCK COPOLYMERS

This invention relates to the preparation and purification of high-X ("chi") diblock copolymers. Such copolymers contain two segments ("blocks") of polymers with significantly different interaction parameters and can be used in directed self-assembly applications.

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Bibliographische Detailangaben
Hauptverfasser:	FARNHAM WILLIAM BROWN, SHEEHAN MICHAEL THOMAS, TRAN HOANG VI
Format:	Patent
Sprache:	eng
Schlagworte:	ADHESIVES CHEMICAL PAINT OR INK REMOVERS CHEMISTRY COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS CORRECTING FLUIDS DYES FILLING PASTES INKS METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS PAINTS PASTES OR SOLIDS FOR COLOURING OR PRINTING POLISHES USE OF MATERIALS THEREFOR WOODSTAINS
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Beschreibung
Zusammenfassung:	This invention relates to the preparation and purification of high-X ("chi") diblock copolymers. Such copolymers contain two segments ("blocks") of polymers with significantly different interaction parameters and can be used in directed self-assembly applications.