ACTIVE MATRIX SUBSTRATE AND MANUFACTURING METHOD OF THE SAME

To reduce the number of photolithography processes in manufacturing an active matrix substrate. Provided is a TFT substrate which has a pixel electrode connected to a drain electrode of a TFT, a source line connected to a source electrode of the TFT, and a gate line connected to a gate electrode of...

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Bibliographische Detailangaben
Hauptverfasser: ISHIGA NOBUAKI, ITO YASUYOSHI, INOUE KAZUNORI, NAGAYAMA KENSUKE, TSUMURA NAOKI
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:To reduce the number of photolithography processes in manufacturing an active matrix substrate. Provided is a TFT substrate which has a pixel electrode connected to a drain electrode of a TFT, a source line connected to a source electrode of the TFT, and a gate line connected to a gate electrode of the TFT. A source electrode, a drain electrode, and a source line include a conductive film of the same layer as the pixel electrode. Under the source line and the pixel electrode, there remains a semiconductor layer of the same layer as a semiconductor film which constitutes a channel part of the TFT substrate.