MULTIPLE MEASUREMENT TECHNIQUES INCLUDING FOCUSED BEAM SCATTEROMETRY FOR CHARACTERIZATION OF SAMPLES

MULTIPLE MEASUREMENT TECHNIQUES INCLUDING FOCUSED BEAM SCATTEROMETRY FOR CHARACTERIZATION OF SAMPLES

A system for monitoring thin-film fabrication processes is herein disclosed. Diffraction of incident light is measured and the results are compared to a predictive model based on at least one idealized or nominal structure. The model and/or the measurement of diffracted incident light may be modifie...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: KOTELYANSKII MICHAEL J, WOLF ROBERT GREGORY
Format: Patent
Sprache:eng
Schlagworte:
INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES
MEASURING
PHYSICS
TESTING
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Beschreibung
Zusammenfassung:A system for monitoring thin-film fabrication processes is herein disclosed. Diffraction of incident light is measured and the results are compared to a predictive model based on at least one idealized or nominal structure. The model and/or the measurement of diffracted incident light may be modified using the output of one or more additional metrology systems.