IMPRINT APPARATUS, IMPRINT METHOD, AND METHOD OF MANUFACTURING ARTICLE

The present invention provides an imprint apparatus for forming a pattern in a plurality of shot regions on a substrate, comprising a heating unit configured to deform each of the shot regions by heating the substrate, and a control unit configured to control the heating unit, wherein when performin...

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Bibliographische Detailangaben
Hauptverfasser:	NAKAGAWA KAZUKI, NISHIKAWARA TOMOFUMI
Format:	Patent
Sprache:	eng
Schlagworte:	AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PERFORMING OPERATIONS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDEDFOR SHAPING OR JOINING OF PLASTICS TRANSPORTING WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
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Beschreibung
Zusammenfassung:	The present invention provides an imprint apparatus for forming a pattern in a plurality of shot regions on a substrate, comprising a heating unit configured to deform each of the shot regions by heating the substrate, and a control unit configured to control the heating unit, wherein when performing imprint processing for a target shot region as a shot region to undergo imprint processing based on heating control information used to heat, by the heating unit, a shot region which has undergone imprint processing prior to the target shot region, the control unit controls heating of the substrate by the heating unit so that a shape of the target shot region which has been deformed by heating of the substrate according to the control information becomes close to a target shape.