Substrate Removal from a Carrier

Methods and apparatuses are provided where a parting agent is applied to at least one portion of a substrate. The at least one portion of the substrate is removed from a carrier.

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Bibliographische Detailangaben
Hauptverfasser: UMMINGER KATHARINA, MARIANI FRANCO, KOLLER ADOLF
Format: Patent
Sprache:eng
Schlagworte:
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Beschreibung
Zusammenfassung:Methods and apparatuses are provided where a parting agent is applied to at least one portion of a substrate. The at least one portion of the substrate is removed from a carrier.