RESIST FOR ELECTRON BEAM AND OPTICAL LITHOGRAPHY

The present invention describes a first generation dendrimers useful in lithography, comprising 1,3,5-trisbromo-methylbenzene as the core and dense, bulky, rigid units selected from trisphenol (1, 1, 1-tris-p-4-hydroxyphenyl ethane), bisphenol-A and 1,5-dihydroxy naphthalene units at the periphery,...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	SANGAVE DADASAHEB VITTHAL, KULKARNI MOHAN GOPALKRISHNA
Format:	Patent
Sprache:	eng
Schlagworte:	ACYCLIC OR CARBOCYCLIC COMPOUNDS APPARATUS SPECIALLY ADAPTED THEREFOR CHEMISTRY CINEMATOGRAPHY ELECTROGRAPHY HETEROCYCLIC COMPOUNDS HOLOGRAPHY MATERIALS THEREFOR METALLURGY ORGANIC CHEMISTRY ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	The present invention describes a first generation dendrimers useful in lithography, comprising 1,3,5-trisbromo-methylbenzene as the core and dense, bulky, rigid units selected from trisphenol (1, 1, 1-tris-p-4-hydroxyphenyl ethane), bisphenol-A and 1,5-dihydroxy naphthalene units at the periphery, wherein the peripheral aromatic rigid molecules are connected to the central core through an ether linkage.