METHOD OF PROTECTING PATIERNED MAGNETIC MATERIALS OF A STACK

The embodiments disclose a method of protecting patterned magnetic materials of a stack, including depositing a thin continuous film of an inert material that is inert to the magnetic materials of a patterned stack upon which the thin continuous film is being deposited and forming a thin interim int...

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Bibliographische Detailangaben
Hauptverfasser: KUO DAVID SHIAO-MIN, WAGO KOICHI, HWU JUSTIN JIA-JEN, XU YUAN, FAN ZHAOHUI
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:The embodiments disclose a method of protecting patterned magnetic materials of a stack, including depositing a thin continuous film of an inert material that is inert to the magnetic materials of a patterned stack upon which the thin continuous film is being deposited and forming a thin interim interface layer from the thin continuous film to protect top and sidewall areas of non-etched higher relief magnetic islands and magnetic film etched surfaces of the patterned stack from air exposure damage and damage from contact with backfilled materials.