ENHANCED PRODUCTIVITY FOR AN ETCH SYSTEM THROUGH POLYMER MANAGEMENT

ENHANCED PRODUCTIVITY FOR AN ETCH SYSTEM THROUGH POLYMER MANAGEMENT

Embodiments described herein generally relate to an apparatus and methods for reducing the deposition of polymers in a semiconductor processing chamber. A heater jacket and heat sources are provided and may be configured to maintain a uniform temperature profile of the processing chamber. A method o...

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Bibliographische Detailangaben
Hauptverfasser: CENG ZHAO H, GRANADOS ALFREDO, BALESAN RAJAN, CHEBI ROBERT, WANG JIANQI
Format: Patent
Sprache:eng
Schlagworte:
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:Embodiments described herein generally relate to an apparatus and methods for reducing the deposition of polymers in a semiconductor processing chamber. A heater jacket and heat sources are provided and may be configured to maintain a uniform temperature profile of the processing chamber. A method of maintaining a uniform temperature profile of a dielectric ceiling of the processing chamber is also provided.