SOLVENT ANNEAL PROCESSING FOR DIRECTED-SELF ASSEMBLY APPLICATIONS

A method and apparatus for solvent annealing a layered substrate including a layer of a block copolymer are provided. The method includes (a) introducing an annealing gas into a processing chamber; (b) maintaining the annealing gas in the processing chamber for a first time period; (c) removing the annealing gas from the processing chamber; and (d) repeating steps (a)-(c) a plurality of times in order induce the block copolymer to undergo cyclic self-assembly. The apparatus includes a processing chamber comprising a process space; a substrate support in the process space; an annealing gas supply and a purge gas supply, both in fluid communication with the process space; a heating element positioned within the processing chamber; an exhaust port in the processing chamber; and a sequencing device programmed to control the annealing gas supply, the heating element, the isolation valve of the exhaust port, and the purge gas supply.