SUBSTRATE STORAGE CONTAINER AND EXPOSURE APPARATUS

Provided is a reticle storage container including an inner container 10 which can store a plurality of reticles 16 and an outer container 1 which covers the inner container 10. The outer container 1 is configured to include a gas nozzle 5 which can inject a predetermined gas. The same gas as the gas...

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Bibliographische Detailangaben
Hauptverfasser:	TANAKA OSAMU, TORIUMI KEIGO, SHIBANO KOHEI
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS BLASTING DRYING DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY HEATING LIGHTING MECHANICAL ENGINEERING SEMICONDUCTOR DEVICES WEAPONS
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Beschreibung
Zusammenfassung:	Provided is a reticle storage container including an inner container 10 which can store a plurality of reticles 16 and an outer container 1 which covers the inner container 10. The outer container 1 is configured to include a gas nozzle 5 which can inject a predetermined gas. The same gas as the gas supplied into an exposure apparatus 20 is supplied to the gas nozzle 5. The gas injected into the reticle storage container is vented through a vent hole 14 installed to the inner container 10.