LITHOGRAPHIC APPARATUS, PROGRAMMABLE PATTERNING DEVICE AND LITHOGRAPHIC METHOD

LITHOGRAPHIC APPARATUS, PROGRAMMABLE PATTERNING DEVICE AND LITHOGRAPHIC METHOD

A lithographic apparatus is disclosed that includes a modulator to modulate a plurality of beams according to a desired pattern and a donor structure on to which the modulated beams impinge. The donor structure is configured such that the impinging modulated beams cause a donor material to be transf...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: BANINE VADIM YEVGENYEVICH, STEVENS LUCAS HENRICUS JOHNANNES, VAN DER SCHOOT HARMEN KLAAS, WUISTER SANDER FREDERIK, BLEEKER ARNO JAN, DE JAGER PIETER WILLEM HERMAN, VERMEULEN JOHANNES PETRUS MARTINUS BERNARDUS
Format: Patent
Sprache:eng
Schlagworte:
LINING MACHINES
PERFORMING OPERATIONS
PRINTING
PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTINGSURFACES
STAMPS
TRANSPORTING
TYPEWRITERS
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Beschreibung
Zusammenfassung:A lithographic apparatus is disclosed that includes a modulator to modulate a plurality of beams according to a desired pattern and a donor structure on to which the modulated beams impinge. The donor structure is configured such that the impinging modulated beams cause a donor material to be transferred from the donor structure to the substrate.