COATING APPARATUS

A coating apparatus for applying a film to a substrate is provided. The coating apparatus includes a coating chamber, a filament fixture having a filament array, a tensioning device to maintain tension on the filament array to maintain filaments in a planar array during the application or removal of...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	SEGERSTEN JUSTIN, HEANEY PATRICK J
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	A coating apparatus for applying a film to a substrate is provided. The coating apparatus includes a coating chamber, a filament fixture having a filament array, a tensioning device to maintain tension on the filament array to maintain filaments in a planar array during the application or removal of current or heat to the filaments, and a movable stage arranged to hold the substrate to be treated in the coating apparatus in proximity to the filament array so as to maintain a constant thermal gradient across the substrates being treated in the apparatus. An apparatus for applying nanocrystalline diamond to a substrate is also provided.