LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

A liquid confinement system for use in immersion lithography is disclosed in which the meniscus of liquid between the liquid confinement system and the substrate is pinned substantially in place by a meniscus pinning feature. The meniscus pinning feature comprises a plurality of discrete outlets arr...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Hauptverfasser:	LIEBREGTS PAULUS MARTINUS MARIA, MONDT EVA, STEFFENS KOEN, BRANDS GERT-JAN GERARDUS JOHANNES THOMAS, HOOGENDAM CHRISTIAAN ALEXANDER, DIRECKS DANIËL JOZEF MARIA, SIMONS WILHELMUS FRANCISCUS JOHANNES, DE METSENAERE CHRISTOPHE, MIRANDA MARCIO ALEXANDRE CANO, VAN LIEROP MATHIEUS ANNA KAREL, RIEPEN MICHEL, BERKVENS PAUL PETRUS JOANNES, SPRUYTENBURG PATRICK JOHANNES WILHELMUS, VERSTRAETE JORIS JOHAN ANNE-MARIE, LEMPENS HAN HENRICUS ALDEGONDA, VAN DER HAM RONALD
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	A liquid confinement system for use in immersion lithography is disclosed in which the meniscus of liquid between the liquid confinement system and the substrate is pinned substantially in place by a meniscus pinning feature. The meniscus pinning feature comprises a plurality of discrete outlets arranged in a polygonal shape.