METHOD FOR MANUFACTURING PATTERN STRUCTURE

A method for manufacturing a pattern structure includes the steps of forming a lift-off material on a base by an inkjet technique, forming a functional film on the base and the lift-off material by atomic layer deposition, and removing the lift-off material by a lift-off technique so as to form a pa...

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Bibliographische Detailangaben
Hauptverfasser:	MIYAGAWA TAKASHI, OKAMOTO KIMIYASU, MURAKAMI TETSUYA
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	A method for manufacturing a pattern structure includes the steps of forming a lift-off material on a base by an inkjet technique, forming a functional film on the base and the lift-off material by atomic layer deposition, and removing the lift-off material by a lift-off technique so as to form a pattern on the base from the functional film.