VARIABLE SHOWERHEAD FLOW BY VARYING INTERNAL BAFFLE CONDUCTANCE

VARIABLE SHOWERHEAD FLOW BY VARYING INTERNAL BAFFLE CONDUCTANCE

Apparatuses and techniques for providing for variable radial flow conductance within a semiconductor processing showerhead are provided. In some cases, the radial flow conductance may be varied dynamically during use. In some cases, the radial flow conductance may be fixed but may vary as a function...

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Bibliographische Detailangaben
Hauptverfasser: MOHN JONATHAN D, TE NIJENHUIS HARALD, LORELLI JEFFREY E, MADRIGAL KEVIN, HAMILTON SHAWN M
Format: Patent
Sprache:eng
Schlagworte:
APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL
ATOMISING APPARATUS
NOZZLES
PERFORMING OPERATIONS
SPRAYING APPARATUS
SPRAYING OR ATOMISING IN GENERAL
TRANSPORTING
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Zusammenfassung:Apparatuses and techniques for providing for variable radial flow conductance within a semiconductor processing showerhead are provided. In some cases, the radial flow conductance may be varied dynamically during use. In some cases, the radial flow conductance may be fixed but may vary as a function of radial distance from the showerhead centerline. Both single plenum and dual plenum showerheads are discussed.