METHOD OF MANUFACTURING A GRAPHENE MONOLAYER ON INSULATING SUBSTRATES

A method of manufacturing a graphene monolayer on insulating substrates from CVD graphene synthesis, comprising: applying a thermal release adhesive tape to the bottom graphene layer deposited at the bottom of the metal foil in the CVD graphene synthesis, detaching the thermal release adhesive tape...

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Bibliographische Detailangaben
Hauptverfasser: CENTENO PEREZ ALBA, ZURUTUZA ELORZA AMAIA, ALONSO RODRIGUEZ BEATRIZ, PESQUERA RODRIGUEZ AMAIA
Format: Patent
Sprache:eng
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Zusammenfassung:A method of manufacturing a graphene monolayer on insulating substrates from CVD graphene synthesis, comprising: applying a thermal release adhesive tape to the bottom graphene layer deposited at the bottom of the metal foil in the CVD graphene synthesis, detaching the thermal release adhesive tape and the bottom graphene layer from the metal foil via the application of heat, from 1° C. up to 5° C. higher than the release temperature of the thermal release adhesive tape so that the thermal release adhesive tape with the bottom graphene layer can be removed, obtaining a metal foil with a top graphene layer sample, and transferring the top graphene layer onto a substrate via a sacrificial protective layer.