Semiconductor Equipment

Semiconductor equipment is provided to include a reaction chamber, a movable frame, and at least one cleaning brush head. The cleaning brush head is configured to operate on at least one dirty portion to be cleaned within the reaction chamber. The movable frame is disposed within the reaction chambe...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: HUANG TSAN-HUA, HUANG CHIEN-PING, HAN TSUNG-HSUN
Format: Patent
Sprache:eng
Schlagworte:
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Beschreibung
Zusammenfassung:Semiconductor equipment is provided to include a reaction chamber, a movable frame, and at least one cleaning brush head. The cleaning brush head is configured to operate on at least one dirty portion to be cleaned within the reaction chamber. The movable frame is disposed within the reaction chamber. The movable frame is capable of carrying a susceptor. The cleaning brush head is capable of touching the dirty portion. The cleaning brush head is capable of moving relative to the dirty portion for removing the residue which is attached to the portion to be cleaned.