MANUFACTURING METHOD OF CIRCUIT PATTERN

This instant disclosure provides a manufacturing method of circuit pattern. The method comprising, forming a substrate; forming a protection layer on the substrate for making the protection layer to be a curved surface along the surface of the substrate; executing a pattern processing for the protec...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
1. Verfasser: HUANG HSING YA
Format: Patent
Sprache:eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:This instant disclosure provides a manufacturing method of circuit pattern. The method comprising, forming a substrate; forming a protection layer on the substrate for making the protection layer to be a curved surface along the surface of the substrate; executing a pattern processing for the protection layer to make the protection layer to form a first pattern on the substrate, wherein a slot region is obtained according to the inner side of the first pattern; coating a macromolecule coating to the slot region for forming an activated metal layer on the substrate, wherein the activated metal layer forms a circuit pattern respective to the slot region, the macromolecule coating includes at least a kind of metal material; removing the protection layer for exposing the activated metal layer with the circuit pattern. The manufacturing quality of the circuit pattern can be improved and the associated cost can be saved.