GENERATION OF ADDITIONAL SHAPES ON A PHOTOMASK FOR A MULTIPLE EXPOSURE PROCESS

The disclosed aspects relate to controlling density of photomasks. One or more unprintable auxiliary patterns can be placed near a mask feature as well as onto a location of a feature of the main pattern. If a density is measured and is not within an acceptable density range, one or more printable auxiliary patterns can be replaced with unprintable auxiliary patterns and/or one or more unprintable auxiliary patterns can be replaced with printable auxiliary patterns. The disclosed aspects can be utilized to create a photomask and/or a semiconductor device, such as a large scale integrated circuit device, that comprises the photomask.