DOUBLE ANODIZING PROCESSES
Methods and structures for forming anodization layers that protect and cosmetically enhance metal surfaces are described. In some embodiments, methods involve forming an anodization layer on an underlying metal that permits an underlying metal surface to be viewable. In some embodiments, methods inv...
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| creator | TATEBE MASASHIGE TAN NAPTHANEAL Y WOODHULL CHARLES B PAKULA DAVID A TAN TANG YEW KIPLE BRYAN PATRICK RUSSELL-CLARKE PETER HANCHAK-CONNORS JULIE BROWNING LUCY ELIZABETH THORNTON, III JOHN MURRAY JOHANNESSEN THOMAS |
| description | Methods and structures for forming anodization layers that protect and cosmetically enhance metal surfaces are described. In some embodiments, methods involve forming an anodization layer on an underlying metal that permits an underlying metal surface to be viewable. In some embodiments, methods involve forming a first anodization layer and an adjacent second anodization layer on an angled surface, the interface between the two anodization layers being regular and uniform. Described are photomasking techniques and tools for providing sharply defined corners on anodized and texturized patterns on metal surfaces. Also described are techniques and tools for providing anodizing resistant components in the manufacture of electronic devices. |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US2013319865A1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US2013319865A1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US2013319865A13</originalsourceid><addsrcrecordid>eNrjZJBy8Q918nFVcPTzd_GM8vRzVwgI8nd2DQ52DeZhYE1LzClO5YXS3AzKbq4hzh66qQX58anFBYnJqXmpJfGhwUYGhsbGhpYWZqaOhsbEqQIAvf4hVg</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>DOUBLE ANODIZING PROCESSES</title><source>esp@cenet</source><creator>TATEBE MASASHIGE ; TAN NAPTHANEAL Y ; WOODHULL CHARLES B ; PAKULA DAVID A ; TAN TANG YEW ; KIPLE BRYAN PATRICK ; RUSSELL-CLARKE PETER ; HANCHAK-CONNORS JULIE ; BROWNING LUCY ELIZABETH ; THORNTON, III JOHN MURRAY ; JOHANNESSEN THOMAS</creator><creatorcontrib>TATEBE MASASHIGE ; TAN NAPTHANEAL Y ; WOODHULL CHARLES B ; PAKULA DAVID A ; TAN TANG YEW ; KIPLE BRYAN PATRICK ; RUSSELL-CLARKE PETER ; HANCHAK-CONNORS JULIE ; BROWNING LUCY ELIZABETH ; THORNTON, III JOHN MURRAY ; JOHANNESSEN THOMAS</creatorcontrib><description>Methods and structures for forming anodization layers that protect and cosmetically enhance metal surfaces are described. In some embodiments, methods involve forming an anodization layer on an underlying metal that permits an underlying metal surface to be viewable. In some embodiments, methods involve forming a first anodization layer and an adjacent second anodization layer on an angled surface, the interface between the two anodization layers being regular and uniform. Described are photomasking techniques and tools for providing sharply defined corners on anodized and texturized patterns on metal surfaces. Also described are techniques and tools for providing anodizing resistant components in the manufacture of electronic devices.</description><language>eng</language><subject>APPARATUS THEREFOR ; CHEMISTRY ; ELECTROFORMING ; ELECTROLYTIC OR ELECTROPHORETIC PROCESSES ; METALLURGY ; PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS</subject><creationdate>2013</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20131205&DB=EPODOC&CC=US&NR=2013319865A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,309,781,886,25569,76552</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20131205&DB=EPODOC&CC=US&NR=2013319865A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>TATEBE MASASHIGE</creatorcontrib><creatorcontrib>TAN NAPTHANEAL Y</creatorcontrib><creatorcontrib>WOODHULL CHARLES B</creatorcontrib><creatorcontrib>PAKULA DAVID A</creatorcontrib><creatorcontrib>TAN TANG YEW</creatorcontrib><creatorcontrib>KIPLE BRYAN PATRICK</creatorcontrib><creatorcontrib>RUSSELL-CLARKE PETER</creatorcontrib><creatorcontrib>HANCHAK-CONNORS JULIE</creatorcontrib><creatorcontrib>BROWNING LUCY ELIZABETH</creatorcontrib><creatorcontrib>THORNTON, III JOHN MURRAY</creatorcontrib><creatorcontrib>JOHANNESSEN THOMAS</creatorcontrib><title>DOUBLE ANODIZING PROCESSES</title><description>Methods and structures for forming anodization layers that protect and cosmetically enhance metal surfaces are described. In some embodiments, methods involve forming an anodization layer on an underlying metal that permits an underlying metal surface to be viewable. In some embodiments, methods involve forming a first anodization layer and an adjacent second anodization layer on an angled surface, the interface between the two anodization layers being regular and uniform. Described are photomasking techniques and tools for providing sharply defined corners on anodized and texturized patterns on metal surfaces. Also described are techniques and tools for providing anodizing resistant components in the manufacture of electronic devices.</description><subject>APPARATUS THEREFOR</subject><subject>CHEMISTRY</subject><subject>ELECTROFORMING</subject><subject>ELECTROLYTIC OR ELECTROPHORETIC PROCESSES</subject><subject>METALLURGY</subject><subject>PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2013</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZJBy8Q918nFVcPTzd_GM8vRzVwgI8nd2DQ52DeZhYE1LzClO5YXS3AzKbq4hzh66qQX58anFBYnJqXmpJfGhwUYGhsbGhpYWZqaOhsbEqQIAvf4hVg</recordid><startdate>20131205</startdate><enddate>20131205</enddate><creator>TATEBE MASASHIGE</creator><creator>TAN NAPTHANEAL Y</creator><creator>WOODHULL CHARLES B</creator><creator>PAKULA DAVID A</creator><creator>TAN TANG YEW</creator><creator>KIPLE BRYAN PATRICK</creator><creator>RUSSELL-CLARKE PETER</creator><creator>HANCHAK-CONNORS JULIE</creator><creator>BROWNING LUCY ELIZABETH</creator><creator>THORNTON, III JOHN MURRAY</creator><creator>JOHANNESSEN THOMAS</creator><scope>EVB</scope></search><sort><creationdate>20131205</creationdate><title>DOUBLE ANODIZING PROCESSES</title><author>TATEBE MASASHIGE ; TAN NAPTHANEAL Y ; WOODHULL CHARLES B ; PAKULA DAVID A ; TAN TANG YEW ; KIPLE BRYAN PATRICK ; RUSSELL-CLARKE PETER ; HANCHAK-CONNORS JULIE ; BROWNING LUCY ELIZABETH ; THORNTON, III JOHN MURRAY ; JOHANNESSEN THOMAS</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US2013319865A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2013</creationdate><topic>APPARATUS THEREFOR</topic><topic>CHEMISTRY</topic><topic>ELECTROFORMING</topic><topic>ELECTROLYTIC OR ELECTROPHORETIC PROCESSES</topic><topic>METALLURGY</topic><topic>PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS</topic><toplevel>online_resources</toplevel><creatorcontrib>TATEBE MASASHIGE</creatorcontrib><creatorcontrib>TAN NAPTHANEAL Y</creatorcontrib><creatorcontrib>WOODHULL CHARLES B</creatorcontrib><creatorcontrib>PAKULA DAVID A</creatorcontrib><creatorcontrib>TAN TANG YEW</creatorcontrib><creatorcontrib>KIPLE BRYAN PATRICK</creatorcontrib><creatorcontrib>RUSSELL-CLARKE PETER</creatorcontrib><creatorcontrib>HANCHAK-CONNORS JULIE</creatorcontrib><creatorcontrib>BROWNING LUCY ELIZABETH</creatorcontrib><creatorcontrib>THORNTON, III JOHN MURRAY</creatorcontrib><creatorcontrib>JOHANNESSEN THOMAS</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>TATEBE MASASHIGE</au><au>TAN NAPTHANEAL Y</au><au>WOODHULL CHARLES B</au><au>PAKULA DAVID A</au><au>TAN TANG YEW</au><au>KIPLE BRYAN PATRICK</au><au>RUSSELL-CLARKE PETER</au><au>HANCHAK-CONNORS JULIE</au><au>BROWNING LUCY ELIZABETH</au><au>THORNTON, III JOHN MURRAY</au><au>JOHANNESSEN THOMAS</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>DOUBLE ANODIZING PROCESSES</title><date>2013-12-05</date><risdate>2013</risdate><abstract>Methods and structures for forming anodization layers that protect and cosmetically enhance metal surfaces are described. In some embodiments, methods involve forming an anodization layer on an underlying metal that permits an underlying metal surface to be viewable. In some embodiments, methods involve forming a first anodization layer and an adjacent second anodization layer on an angled surface, the interface between the two anodization layers being regular and uniform. Described are photomasking techniques and tools for providing sharply defined corners on anodized and texturized patterns on metal surfaces. Also described are techniques and tools for providing anodizing resistant components in the manufacture of electronic devices.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | APPARATUS THEREFOR CHEMISTRY ELECTROFORMING ELECTROLYTIC OR ELECTROPHORETIC PROCESSES METALLURGY PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS |
| title | DOUBLE ANODIZING PROCESSES |
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