DOUBLE ANODIZING PROCESSES

Methods and structures for forming anodization layers that protect and cosmetically enhance metal surfaces are described. In some embodiments, methods involve forming an anodization layer on an underlying metal that permits an underlying metal surface to be viewable. In some embodiments, methods inv...

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Hauptverfasser: TATEBE MASASHIGE, TAN NAPTHANEAL Y, WOODHULL CHARLES B, PAKULA DAVID A, TAN TANG YEW, KIPLE BRYAN PATRICK, RUSSELL-CLARKE PETER, HANCHAK-CONNORS JULIE, BROWNING LUCY ELIZABETH, THORNTON, III JOHN MURRAY, JOHANNESSEN THOMAS
Format: Patent
Sprache:eng
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Zusammenfassung:Methods and structures for forming anodization layers that protect and cosmetically enhance metal surfaces are described. In some embodiments, methods involve forming an anodization layer on an underlying metal that permits an underlying metal surface to be viewable. In some embodiments, methods involve forming a first anodization layer and an adjacent second anodization layer on an angled surface, the interface between the two anodization layers being regular and uniform. Described are photomasking techniques and tools for providing sharply defined corners on anodized and texturized patterns on metal surfaces. Also described are techniques and tools for providing anodizing resistant components in the manufacture of electronic devices.