EXPOSURE METHOD AND APPARATUS, MAINTENANCE METHOD AND DEVICE MANUFACTURING METHOD

An exposure apparatus exposes a substrate with an exposure light via a projection optical system and a liquid, and includes a flow channel forming member and a substrate stage. The flow channel forming member forms an immersion area of the liquid at an image surface side of the projection optical sy...

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Bibliographische Detailangaben
1. Verfasser:	NAKANO KATSUSHI
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	An exposure apparatus exposes a substrate with an exposure light via a projection optical system and a liquid, and includes a flow channel forming member and a substrate stage. The flow channel forming member forms an immersion area of the liquid at an image surface side of the projection optical system. The substrate stage has a wall portion provided so as to surround a support portion which supports the substrate, and a recovery port capable of recovering the liquid in a recess formed at an outside of the wall portion with respect to an optical axis of the projection optical system. When a cleaning is performed, a cleaning liquid is recovered via the recovery port.