OPTIMIZING TIMING CRITICAL PATHS BY MODULATING SYSTEMIC PROCESS VARIATION

Systems and methods are provided to optimize critical paths by modulating systemic process variations, such as regional timing variations in IC designs. A method includes determining a physical location of an element in the semiconductor chip design within the critical path. The method further includes modulating a systemic process variation of the semiconductor chip design to speed up the critical path based on a polysilicon conductor perimeter density associated with the element.