METHOD FOR MANUFACTURING LASER REFLECTIVE MASK

A method of fabricating a laser reflective mask by forming a sacrificial layer on top of a base substrate; recessing the sacrificial layer and the base substrate through an etching process of a region prearranged as a reflection region for a laser beam in the base substrate to form a sacrificial layer pattern and a reflective layer filling groove having a predetermined depth; alternately and repeatedly laminating first and second reflective layers having different reflectances on top of the base substrate on which the sacrificial layer pattern and the reflective layer filling groove are formed until the reflective layer filling groove is completely filled; removing the sacrificial layer pattern and the first and second reflective layers laminated on top of the sacrificial layer pattern through a laser lift-off process of irradiating the base substrate with the laser beam from a bottom surface of the base substrate to form a reflective layer pattern configured to be filled in the reflective layer filling groove; and removing the sacrificial layer pattern remaining on top of the base substrate.