HYBRID METROLOGY FOR SEMICONDUCTOR DEVICES

Methods and systems are provided for fabricating and measuring physical features of a semiconductor device structure. An exemplary method of fabricating a semiconductor device structure involves forming a first feature of the semiconductor device structure on a substrate of semiconductor material, o...

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Bibliographische Detailangaben
Hauptverfasser: SENDELBACH MATTHEW J, VAID ALOK, SALEH NED R, RANA NARENDER
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:Methods and systems are provided for fabricating and measuring physical features of a semiconductor device structure. An exemplary method of fabricating a semiconductor device structure involves forming a first feature of the semiconductor device structure on a substrate of semiconductor material, obtaining a first measurement for the semiconductor device structure from a first metrology tool, obtaining a second measurement of the first feature of the semiconductor device structure from a second metrology tool, and determining a hybrid measurement for the first feature based at least in part on the first measurement and the second measurement.