METHODS OF FABRICATING SEMICONDUCTOR DEVICES AND METHODS OF FABRICATING GATE INSULATING LAYERS

A method of fabricating a semiconductor device may include forming active and field regions in a substrate; forming a gate trench in which the active and field regions are exposed; forming a gate insulating layer on a surface of the exposed active region, wherein forming the gate insulating layer in...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	PARK TAI-SU, LEE GUN-JOONG, HAN SANGUL, YOON JOO-BYOUNG, LEE YOUNG-DONG
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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