DRAWING APPARATUS, AND METHOD OF MANUFACTURING ARTICLE

The present invention provides a drawing apparatus which performs drawing on a substrate with a charged particle beam based on drawing data generated from pattern data representing a circuit pattern to be drawn on the substrate, and mark data representing a mark to be drawn on the substrate, the app...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	KOTOKU MASASHI, HAGINIWA KUNIYASU
Format:	Patent
Sprache:	eng
Schlagworte:	GAMMA RAY OR X-RAY MICROSCOPES IRRADIATION DEVICES NUCLEAR ENGINEERING NUCLEAR PHYSICS PHYSICS TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOTOTHERWISE PROVIDED FOR
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!