DRAWING APPARATUS, AND METHOD OF MANUFACTURING ARTICLE

The present invention provides a drawing apparatus which performs drawing on a substrate with a charged particle beam based on drawing data generated from pattern data representing a circuit pattern to be drawn on the substrate, and mark data representing a mark to be drawn on the substrate, the app...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: KOTOKU MASASHI, HAGINIWA KUNIYASU
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:The present invention provides a drawing apparatus which performs drawing on a substrate with a charged particle beam based on drawing data generated from pattern data representing a circuit pattern to be drawn on the substrate, and mark data representing a mark to be drawn on the substrate, the apparatus including an obtaining unit configured to obtain information associated with a positioning accuracy of the charged particle beam relative to the substrate, a determination unit configured to determine a drawing region for the mark based on the obtained information, and a generation unit configured to generate the drawing data by combining the pattern data and the mark data such that the mark is drawn in the determined drawing region.