CARBAMOYLOXYADAMANTANE DERIVATIVE, POLYMER COMPOUND, AND PHOTORESIST COMPOSITION
To provide a novel acrylic ester derivative which can form a structural unit of a polymer to be incorporated into a photoresist composition, a polymer produced through polymerization of a raw material containing the acrylic ester derivative, and a photoresist composition which contains the polymer a...
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| creator | FUKUMOTO TAKASHI YADA MANABU |
| description | To provide a novel acrylic ester derivative which can form a structural unit of a polymer to be incorporated into a photoresist composition, a polymer produced through polymerization of a raw material containing the acrylic ester derivative, and a photoresist composition which contains the polymer and which, as compared with the case of conventional ones, realizes formation of a high-resolution resist pattern having improved LWR. The invention provides a carbamoyloxyadamantane derivative represented by the following formula (wherein R represents a hydrogen atom, a methyl group, or a trifluoromethyl group), a polymer produced by polymerizing a raw material containing the carbamoyloxyadamantane derivative, and a photoresist composition containing the polymer, a photoacid generator, and a solvent. |
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The invention provides a carbamoyloxyadamantane derivative represented by the following formula (wherein R represents a hydrogen atom, a methyl group, or a trifluoromethyl group), a polymer produced by polymerizing a raw material containing the carbamoyloxyadamantane derivative, and a photoresist composition containing the polymer, a photoacid generator, and a solvent.</description><language>eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS</subject><creationdate>2013</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20130627&DB=EPODOC&CC=US&NR=2013164676A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76290</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20130627&DB=EPODOC&CC=US&NR=2013164676A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>FUKUMOTO TAKASHI</creatorcontrib><creatorcontrib>YADA MANABU</creatorcontrib><title>CARBAMOYLOXYADAMANTANE DERIVATIVE, POLYMER COMPOUND, AND PHOTORESIST COMPOSITION</title><description>To provide a novel acrylic ester derivative which can form a structural unit of a polymer to be incorporated into a photoresist composition, a polymer produced through polymerization of a raw material containing the acrylic ester derivative, and a photoresist composition which contains the polymer and which, as compared with the case of conventional ones, realizes formation of a high-resolution resist pattern having improved LWR. The invention provides a carbamoyloxyadamantane derivative represented by the following formula (wherein R represents a hydrogen atom, a methyl group, or a trifluoromethyl group), a polymer produced by polymerizing a raw material containing the carbamoyloxyadamantane derivative, and a photoresist composition containing the polymer, a photoacid generator, and a solvent.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2013</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZAhwdgxycvT1j_Txj4h0dHH0dfQLcfRzVXBxDfIMcwzxDHPVUQjw94n0dQ1ScPb3DfAP9XPRUXD0c1EI8PAP8Q9yDfYMDoHIBHuGePr78TCwpiXmFKfyQmluBmU31xBnD93Ugvz41OKCxOTUvNSS-NBgIwNDY0MzEzNzM0dDY-JUAQCNHDC6</recordid><startdate>20130627</startdate><enddate>20130627</enddate><creator>FUKUMOTO TAKASHI</creator><creator>YADA MANABU</creator><scope>EVB</scope></search><sort><creationdate>20130627</creationdate><title>CARBAMOYLOXYADAMANTANE DERIVATIVE, POLYMER COMPOUND, AND PHOTORESIST COMPOSITION</title><author>FUKUMOTO TAKASHI ; YADA MANABU</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US2013164676A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2013</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>FUKUMOTO TAKASHI</creatorcontrib><creatorcontrib>YADA MANABU</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>FUKUMOTO TAKASHI</au><au>YADA MANABU</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>CARBAMOYLOXYADAMANTANE DERIVATIVE, POLYMER COMPOUND, AND PHOTORESIST COMPOSITION</title><date>2013-06-27</date><risdate>2013</risdate><abstract>To provide a novel acrylic ester derivative which can form a structural unit of a polymer to be incorporated into a photoresist composition, a polymer produced through polymerization of a raw material containing the acrylic ester derivative, and a photoresist composition which contains the polymer and which, as compared with the case of conventional ones, realizes formation of a high-resolution resist pattern having improved LWR. The invention provides a carbamoyloxyadamantane derivative represented by the following formula (wherein R represents a hydrogen atom, a methyl group, or a trifluoromethyl group), a polymer produced by polymerizing a raw material containing the carbamoyloxyadamantane derivative, and a photoresist composition containing the polymer, a photoacid generator, and a solvent.</abstract><oa>free_for_read</oa></addata></record> |
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| language | eng |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
| title | CARBAMOYLOXYADAMANTANE DERIVATIVE, POLYMER COMPOUND, AND PHOTORESIST COMPOSITION |
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