CARBAMOYLOXYADAMANTANE DERIVATIVE, POLYMER COMPOUND, AND PHOTORESIST COMPOSITION

To provide a novel acrylic ester derivative which can form a structural unit of a polymer to be incorporated into a photoresist composition, a polymer produced through polymerization of a raw material containing the acrylic ester derivative, and a photoresist composition which contains the polymer a...

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Bibliographische Detailangaben
Hauptverfasser:	FUKUMOTO TAKASHI, YADA MANABU
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	To provide a novel acrylic ester derivative which can form a structural unit of a polymer to be incorporated into a photoresist composition, a polymer produced through polymerization of a raw material containing the acrylic ester derivative, and a photoresist composition which contains the polymer and which, as compared with the case of conventional ones, realizes formation of a high-resolution resist pattern having improved LWR. The invention provides a carbamoyloxyadamantane derivative represented by the following formula (wherein R represents a hydrogen atom, a methyl group, or a trifluoromethyl group), a polymer produced by polymerizing a raw material containing the carbamoyloxyadamantane derivative, and a photoresist composition containing the polymer, a photoacid generator, and a solvent.